The Nanoflame NF02 is a high-precision flame-pyrolytic deposition system engineered to functionalize material surfaces. By utilizing a specialized combustion process, the system deposits a thin, highly dense silicon dioxide layer onto a variety of substrates to significantly enhance surface characteristics.
The NanoFlame NF02 generates a very thin (20-50nm), but very dense, layer of silicon dioxide by flame-pyrolytic deposition of an organosilicon compound. These silicon dioxide layers produce very high surface energies and adhere strongly on:
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