UV-LED Lithography Exposure Systems

Output Power Levels to Rival Up-to-5 kW Mercury Arc Lamps

Explore our high-performance UV-LED Lithography Exposure Systems and precision curing solutions for the near UV (NUV) spectral ranges (i-line, CWL 365 nm / h-line, CWL 405 nm / g-line, CWL 436 nm). Our products perform exceptionally well in mask aligners for wafers up to 12″ (300 mm), wafer steppers, large-substrate flood exposure equipment, nanoimprint lithography (NIL) tools, and high-power maskless direct imagers used for DMD / DLP® projection.

Primelite’s Advanced UV-LED Light Engines are your reliable tools of choice for low- and high-volume manufacturing environments. If you are looking to design new exposure systems or retrofit a replacement for conventional mercury discharge lamps, look no further. Let our industry-proven UV-LED light sources provide the illumination you need.